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ISO9001 133OD*125ID*2940 Titanium Tube Targets Semiconductor

    Buy cheap ISO9001 133OD*125ID*2940 Titanium Tube Targets Semiconductor from wholesalers
     
    Buy cheap ISO9001 133OD*125ID*2940 Titanium Tube Targets Semiconductor from wholesalers
    • Buy cheap ISO9001 133OD*125ID*2940 Titanium Tube Targets Semiconductor from wholesalers
    • Buy cheap ISO9001 133OD*125ID*2940 Titanium Tube Targets Semiconductor from wholesalers

    ISO9001 133OD*125ID*2940 Titanium Tube Targets Semiconductor

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    Brand Name : Feiteng
    Model Number : Titanium tube target
    Certification : GB/T19001-2016 idt ISO9001:2015 GJB9001C-2017
    Price : To be negotiated
    Payment Terms : T/T
    Supply Ability : To be negotiated
    Delivery Time : To be negotiated
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    ISO9001 133OD*125ID*2940 Titanium Tube Targets Semiconductor

    133OD*125ID*2940 Titanium Tube Target Titanium Gr2 ASTM B861-06 a The Target Material Vacuum Coating

    NameTitanium tube target
    Standard

    ASTM B861-06 a

    Transport Package

    Vacuum package in wooden case

    Origin

    Baoji, Shaanxi, China

    Port of deliver

    Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port

    Sizeφ133*φ125*2940(include flange)

    Titanium is a widely used metal, due to its light weight, higher strength than aluminum alloy, can maintain a higher strength than aluminum at high temperature and is highly valued by the aviation industry.The presence of impurities in titanium significantly affects the physical, chemical, mechanical properties and corrosion resistance of titanium. In particular, some interstitial impurities can distort the crystal lattice of titanium and affect various properties of titanium.The presence of impurities in titanium greatly affects its mechanical properties, especially the interstitial impurities (oxygen, nitrogen, carbon) can greatly improve the strength of titanium and significantly reduce its plasticity. The good mechanical properties of titanium as a structural material are achieved by strictly controlling the appropriate impurity content and adding alloying elements.

    At present, many countries have developed a variety of advanced titanium submersible, submarine, submarine laboratory equipment to carry out Marine research. In addition, titanium equipment and devices are widely used in coastal power stations, offshore oil production equipment, seawater desalination, Marine chemical production and mariculture.Due to the weak rejection reaction of titanium metal with human tissue, it is widely used in artificial bones, artificial joints, artificial teeth and other human implants.


    The technological development trend of target materials is closely related to the development trend of film technology in downstream application industries. The width of the interconnects is decreasing. Wafer manufacturers require large size, high purity, low segregation and fine grains for the target, which requires the target to have a better microstructure. The crystal particle diameter and uniformity of the target have been considered as the key factors affecting the deposition rate of the film. Flat panel display (FPD) has greatly impacted the cathode ray tube (CRT) -based computer monitor and TELEVISION market in recent years, and will also drive ITO target technology and market demand. ITO targets today come in two varieties.


    Main advantages
    Low density high specification strength
    Custom request customization
    Excellent corrosion resistance
    Good heat resistance
    Excellent low temperature performance
    Good thermal properties
    Low elastic modulus


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